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Growth of aligned carbon nanotubes by plasma-enhanced chemical vapor deposition: Optimization of growth parameters
https://nitech.repo.nii.ac.jp/records/4986
https://nitech.repo.nii.ac.jp/records/49860594670a-ad5d-4c47-a207-9b8b65100e10
| 名前 / ファイル | ライセンス | アクション |
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本文_fulltext (577.1 kB)
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Copyright (2001) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.The following article appeared in Journal of Applied Physics, 90(3), pp.1529- 1533 ; 2001and may be found at http://link.aip.org/link/?jap/90/1529
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| 公開日 | 2012-11-06 | |||||||||||||||||||
| タイトル | ||||||||||||||||||||
| タイトル | Growth of aligned carbon nanotubes by plasma-enhanced chemical vapor deposition: Optimization of growth parameters | |||||||||||||||||||
| 言語 | en | |||||||||||||||||||
| 言語 | ||||||||||||||||||||
| 言語 | eng | |||||||||||||||||||
| 資源タイプ | ||||||||||||||||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||||||||||||||||
| 資源タイプ | journal article | |||||||||||||||||||
| 著者 |
Tanemura, Masaki
× Tanemura, Masaki
× Iwata, K.
× Takahashi, K.
× Fujimoto, Y.
× Okuyama, F.
× Sugie, H.
× Filip, V.
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| 著者別名 | ||||||||||||||||||||
| 姓名 | 種村, 眞幸 | |||||||||||||||||||
| 書誌情報 |
en : JOURNAL OF APPLIED PHYSICS 巻 90, 号 3, p. 1529-1533, 発行日 2001-08-01 |
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| 出版者 | ||||||||||||||||||||
| 出版者 | American Institute of Physics | |||||||||||||||||||
| 言語 | en | |||||||||||||||||||
| ISSN | ||||||||||||||||||||
| 収録物識別子タイプ | ISSN | |||||||||||||||||||
| 収録物識別子 | 0021-8979 | |||||||||||||||||||
| item_10001_source_id_32 | ||||||||||||||||||||
| 収録物識別子タイプ | NCID | |||||||||||||||||||
| 収録物識別子 | AA00693547 | |||||||||||||||||||
| 出版タイプ | ||||||||||||||||||||
| 出版タイプ | VoR | |||||||||||||||||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||||||||||||||||
| item_10001_relation_34 | ||||||||||||||||||||
| 関連タイプ | isIdenticalTo | |||||||||||||||||||
| 識別子タイプ | DOI | |||||||||||||||||||
| 関連識別子 | http://dx.doi.org/10.1063/1.1382848 | |||||||||||||||||||
| 関連名称 | 10.1063/1.1382848 | |||||||||||||||||||
| 内容記述 | ||||||||||||||||||||
| 内容記述タイプ | Other | |||||||||||||||||||
| 内容記述 | Direct-current plasma-enhanced chemical vapor deposition (CVD) with mixtures of acetylene and ammonia was optimized to synthesize aligned carbon nanotubes (CNTs) on Co- or Ni-covered W wires with regard to wire temperature, wire diameter, gas pressure, and sample bias. A phase diagram of CNT growth was established experimentally in this optimization process. It was revealed by transmission electron microscopy that Co-catalyzed CNTs encapsulated a Co carbide nanoparticle at their tip, disagreeing with a previous report that Co particles were located at the base of CNTs CVD grown on Co-covered Si substrates [C. Bower et al., Appl. Phys. Lett. 77, 2767 (2000)]. This leads to the conclusion that the formation mechanism of aligned CNTs depends significantly on the catalyst support material as well as the catalyst material itself. Since the sample bias strongly affected the morphology of CNTs, the selective supply of positive ions to CNT tips was possibly responsible for the alignment of growing CNTs. | |||||||||||||||||||
| 言語 | en | |||||||||||||||||||
