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Electronic properties in Ga-doped CdTe layers grown by metalorganic vapor phase epitaxy
https://nitech.repo.nii.ac.jp/records/4175
https://nitech.repo.nii.ac.jp/records/41750c503193-6603-4fac-8614-832ff658ee0a
名前 / ファイル | ライセンス | アクション |
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本文_fulltext (500.1 kB)
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Copyright (1992) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.The following article appeared in Journal of Applied Physics, 72(8), pp.3406-3409 ; 1992 and may be found at http://link.aip.org/link/?jap/72/3406
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2012-11-06 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Electronic properties in Ga-doped CdTe layers grown by metalorganic vapor phase epitaxy | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
Ekawa, Mitsuru
× Ekawa, Mitsuru× Yasuda, Kazuhito× Ferid, Touati× Saji, Manabu× Tanaka, Akikazu |
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著者別名 | ||||||
姓名 | 安田, 和人 | |||||
書誌情報 |
JOURNAL OF APPLIED PHYSICS 巻 72, 号 8, p. 3406-3409, 発行日 1992-10-15 |
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出版者 | ||||||
出版者 | American Institute of Physics | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 00218979 | |||||
書誌レコードID(NCID) | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA00693547 | |||||
著者版フラグ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
DOI | ||||||
関連タイプ | isIdenticalTo | |||||
識別子タイプ | DOI | |||||
関連識別子 | http://dx.doi.org/10.1063/1.351412 | |||||
関連名称 | 10.1063/1.351412 | |||||
内容記述 | ||||||
内容記述タイプ | Other | |||||
内容記述 | Electronic properties in Ga‐doped (100) CdTe layers on (100) GaAs grown by atmospheric pressure metalorganic vapor phase epitaxy were studied. Triethylgallium was used as a dopant source. The source materials were dimethylcadmium (DMCd) and diethyltelluride (DETe). The effects of the DETe/DMCd (VI/II) ratio on the electrical properties were evaluated by Hall measurements. Electron concentration (300 K) was controlled from 3.5×1014 cm-3 to 2.5×1016 cm-3 by the VI/II ratio in the range 0.5 to 2. Higher growth temperature lowered the electron concentration. High electron mobility of 630 cm2/Vs (300 K) was obtained for a growth temperature of 375°C and a VI/II ratio of 2. Good correspondence was observed between electrical and photoluminescence (PL) properties. Both intensity and linewidth of a neutral‐donor bound‐exciton (D0,X) emission at 1.5932 eV increased with the electron concentration. The ionization energy of the Ga donor was estimated to be about 18 meV from electrical and PL properties. A Ga incorporation mechanism was deduced on the basis of the experimental results. | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf |