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Epitaxial Bi3Fe5O12(001) films grown by pulsed laser deposition and reactive ion beam sputtering techniques
https://nitech.repo.nii.ac.jp/records/4863
https://nitech.repo.nii.ac.jp/records/4863ad6ef0f6-5539-457d-9b86-319cbfb7dd55
| 名前 / ファイル | ライセンス | アクション |
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本文_fulltext (123.7 kB)
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Copyright (2000) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.The following article appeared in Journal of Applied Physics, 88(5), pp.2734-2739 ; 2000 and may be found at http://link.aip.org/link/?jap/88/2734
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||||||||||||||||||
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| 公開日 | 2012-11-06 | |||||||||||||||||||||
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| タイトル | Epitaxial Bi3Fe5O12(001) films grown by pulsed laser deposition and reactive ion beam sputtering techniques | |||||||||||||||||||||
| 言語 | en | |||||||||||||||||||||
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| 言語 | eng | |||||||||||||||||||||
| 資源タイプ | ||||||||||||||||||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||||||||||||||||||
| 資源タイプ | journal article | |||||||||||||||||||||
| 著者 |
安達, 信泰
× 安達, 信泰
× Denysenkov, V. P.
× Khartsev, S. I.
× Grishina, A. M.
× Okuda, T.
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| 著者別名 | ||||||||||||||||||||||
| 姓名 | 安達, 信泰 | |||||||||||||||||||||
| 言語 | ja | |||||||||||||||||||||
| 姓名 | アダチ, ノブヤス | |||||||||||||||||||||
| 言語 | ja-Kana | |||||||||||||||||||||
| 姓名 | Adachi, Nobuyasu | |||||||||||||||||||||
| 言語 | en | |||||||||||||||||||||
| bibliographic_information |
en : JOURNAL OF APPLIED PHYSICS 巻 88, 号 5, p. 2734-2739, 発行日 2000-09-01 |
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| 出版者 | ||||||||||||||||||||||
| 出版者 | American Institute of Physics | |||||||||||||||||||||
| 言語 | en | |||||||||||||||||||||
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| 収録物識別子タイプ | ISSN | |||||||||||||||||||||
| 収録物識別子 | 0021-8979 | |||||||||||||||||||||
| item_10001_source_id_32 | ||||||||||||||||||||||
| 収録物識別子タイプ | NCID | |||||||||||||||||||||
| 収録物識別子 | AA00693547 | |||||||||||||||||||||
| 出版タイプ | ||||||||||||||||||||||
| 出版タイプ | VoR | |||||||||||||||||||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||||||||||||||||||
| 内容記述 | ||||||||||||||||||||||
| 内容記述タイプ | Other | |||||||||||||||||||||
| 内容記述 | We report on processing and comparative characterization of epitaxial Bi3Fe5O12 (BIG) films grown onto Gd3(ScGa)5O12[GSGG,(001)] single crystal using pulsed laser deposition (PLD) and reactive ion beam sputtering (RIBS) techniques. A very high deposition rate of about 0.8 μm/h has been achieved in the PLD process. Comprehensive x-ray diffraction analyses reveal epitaxial quality both of the films: they are single phase, exclusively (001) oriented, the full width at half maximum of the rocking curve of (004) Bragg reflection is 0.06 deg for PLD and 0.05 deg for RIBS film, strongly in-plane textured with cube-on-cube film-to-substrate epitaxial relationship. Saturation magnetization 4πMs and Faraday rotation at 635 nm were found to be 1400 Gs and -7.8 deg/μm in PLD-BIG, and 1200 Gs and -6.9 deg/μm in RIBS-BIG. Ferromagnetic resonance (FMR) measurements performed at 9.25 GHz yielded the gyromagnetic ratio γ=1.797×107l/sOe, 1.826×107l/sOe; the constants of uniaxial magnetic anisotropy were Ku*=8.66×104erg/cm3, -8.60×104erg/cm3; the cubic magnetic anisotropy K1=-2.7×103erg/cm3,-3.8×103erg/cm3; and the FMR linewidth ΔH=25 and 34 Oe for PLD and RIBS films correspondingly. High Faraday rotation, low microwave loss, and low coercive field ?40 Oe of BIG/GSGG(001) films promise their use in integrated magneto-optic applications. | |||||||||||||||||||||
| 言語 | en | |||||||||||||||||||||
