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Model and probe measurements of inductively coupled CF4 discharges
https://nitech.repo.nii.ac.jp/records/5079
https://nitech.repo.nii.ac.jp/records/5079570493e8-735a-46bc-9256-0e940fa96b00
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
本文_fulltext (113.4 kB)
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Copyright (2002) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.The following article appeared in Journal of Applied Physics, 92(4), pp.1780- 1787 ; 2002 and may be found at http://link.aip.org/link/?jap/92/1780
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||||||
|---|---|---|---|---|---|---|---|---|---|---|
| 公開日 | 2012-11-06 | |||||||||
| タイトル | ||||||||||
| タイトル | Model and probe measurements of inductively coupled CF4 discharges | |||||||||
| 言語 | en | |||||||||
| 言語 | ||||||||||
| 言語 | eng | |||||||||
| 資源タイプ | ||||||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||||||
| 資源タイプ | journal article | |||||||||
| 著者 |
Kimura, Takashi
× Kimura, Takashi
× Oe, K.
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| 著者別名 | ||||||||||
| 姓名 | 木村, 高志 | |||||||||
| bibliographic_information |
en : JOURNAL OF APPLIED PHYSICS 巻 92, 号 4, p. 1780-1787, 発行日 2002-08-15 |
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| 出版者 | ||||||||||
| 出版者 | American Institute of Physics | |||||||||
| 言語 | en | |||||||||
| ISSN | ||||||||||
| 収録物識別子タイプ | ISSN | |||||||||
| 収録物識別子 | 0021-8979 | |||||||||
| item_10001_source_id_32 | ||||||||||
| 収録物識別子タイプ | NCID | |||||||||
| 収録物識別子 | AA00693547 | |||||||||
| 出版タイプ | ||||||||||
| 出版タイプ | VoR | |||||||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||||||
| item_10001_relation_34 | ||||||||||
| 関連タイプ | isIdenticalTo | |||||||||
| 識別子タイプ | DOI | |||||||||
| 関連識別子 | http://dx.doi.org/10.1063/1.1491023 | |||||||||
| 関連名称 | 10.1063/1.1491023 | |||||||||
| 内容記述 | ||||||||||
| 内容記述タイプ | Other | |||||||||
| 内容記述 | A global model for electronegative plasma, in which the negative ion distribution is assumed to be a parabolic profile in the axial direction with a flat central region and a similar edge profile in the radial direction in the electronegative region, is applied to study the power and pressure dependences of plasma parameters in low-pressure CF4 discharges. The electron density increases approximately linearly with the power. The electron temperature also increases with the power due to the decrease in neutral number density with increase in power, resulting in the increase in plasma potential. The density of CF3+ is a weak function of the power, while the densities of CF2+, CF+, and F+, which are strongly correlated to the densities of the respective radicals, depend on the power. On the other hand, the decrease in electron temperature with the pressure significantly results in a decrease in the degree of dissociation. The electron density also decreases gradually with the pressure except for the case of pressure lower than 5 mTorr. The densities of CF2+, CF+, and F+ decrease gradually with the pressure at pressures higher than 5 mTorr, while the density of CF3+ increases gradually with the pressure. The electron energy probability function (EEPF) is measured with a Langmuir probe in an inductively coupled rf (13.56 MHz) CF4 discharge over a pressure range from 2 to 30 mTorr, while keeping the power injected into the plasma at about 70 W. The measured EEPFs are approximately Maxwellian at any pressure, although there is a slight deviation from a Maxwellian distribution at pressures higher than 10 mTorr. The results estimated from the measured EEPF are compared to the model and show reasonably good agreement. | |||||||||
| 言語 | en | |||||||||
