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Structural investigation of keV Ar-ion-induced surface ripples in Si by cross-sectional transmission electron microscopy
https://nitech.repo.nii.ac.jp/records/5139
https://nitech.repo.nii.ac.jp/records/513906211cd0-d39e-4109-bc5e-468221b1d57c
名前 / ファイル | ライセンス | アクション |
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本文_fulltext (759.0 kB)
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(c)2003 The American Physical Society
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2012-11-06 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Structural investigation of keV Ar-ion-induced surface ripples in Si by cross-sectional transmission electron microscopy | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
Chini, T. K.
× Chini, T. K.× Okuyama, F.× Tanemura, Masaki× Nordlund, K. |
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著者別名 | ||||||
姓名 | 種村, 眞幸 | |||||
書誌情報 |
PHYSICAL REVIEW B 巻 67, 号 20, p. 205403-1-205403-6, 発行日 2003-05-06 |
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出版者 | ||||||
出版者 | American Physical Society | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 10980121 | |||||
書誌レコードID(NCID) | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA11187113 | |||||
著者版フラグ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
DOI | ||||||
関連タイプ | isIdenticalTo | |||||
識別子タイプ | DOI | |||||
関連識別子 | http://dx.doi.org/10.1103/PhysRevB.67.205403 | |||||
関連名称 | 10.1103/PhysRevB.67.205403 | |||||
内容記述 | ||||||
内容記述タイプ | Other | |||||
内容記述 | Using cross-section transmission electron microscopy (XTEM) we have studied the surface and subsurface structure of individual ripples having submicron scale wavelength and nanometer scale amplitude, generated by obliquely incident (50?120 keV) Ar ion bombardment of Si. The XTEM results reveal that the front slopes of ion-induced ripples have amorphous layers containing bubbles with sizes ranging from about 3 to 15 nm facing the ion beam direction. A hinner amorphous layer without bubbles, on the other hand, persists on the rear slope of ripples. We also observe an irregular interface between a-Si and c-Si, which is due to the direct impact amorphization mechanism prevalent near the end-of-range during heavy ion irradiation. | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf |