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Electrochemical deposition of Cu-doped p-type iron oxide thin films
https://nitech.repo.nii.ac.jp/records/6661
https://nitech.repo.nii.ac.jp/records/6661dc8fadb9-1fe3-491c-813c-7072c2fd63f5
名前 / ファイル | ライセンス | アクション |
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本文_fulltext (1.4 MB)
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This is an author-created, un-copyedited version of an article accepted for publication/published in Semiconductor Science and Technology. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at 10.1088/1361-6641/aad76a.
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2021-01-20 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Electrochemical deposition of Cu-doped p-type iron oxide thin films | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
Kobayashi, Satoshi
× Kobayashi, Satoshi× Ichimura, Masaya |
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著者別名 | ||||||
姓名 | 市村, 正也 | |||||
書誌情報 |
en : Semiconductor Science and Technology 巻 33, 号 10, p. 105006, 発行日 2018-09-19 |
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出版者 | ||||||
出版者 | IOP Publishing | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 02681242 | |||||
書誌レコードID(NCID) | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA10695094 | |||||
著者版フラグ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | https://doi.org/10.1088/1361-6641/aad76a | |||||
関連名称 | 10.1088/1361-6641/aad76a | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf |