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Measurements indicate that explosive crystallization starts very near the Si surface from a highly undercooled liquid Si layer thinner than 3 nm for laser irradiation with long pulses ranging from 65 to 200 ns. During the laser irradiation, surface melt-in continues into fine-grained polycrystalline Si produced by explosive crystallization, followed by solidification of the surface-liquid layer.","subitem_description_language":"en","subitem_description_type":"Other"}]},"item_10001_full_name_27":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"8780","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"1000010223679","nameIdentifierScheme":"NRID","nameIdentifierURI":"http://rns.nii.ac.jp/nr/1000010223679"}],"names":[{"name":"江龍, 修"}]}]},"item_10001_publisher_29":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"American Physical Society","subitem_publisher_language":"en"}]},"item_10001_relation_34":{"attribute_name":"item_10001_relation_34","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"10.1103/PhysRevLett.59.2203"}],"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"http://dx.doi.org/10.1103/PhysRevLett.59.2203","subitem_relation_type_select":"DOI"}}]},"item_10001_source_id_30":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0031-9007","subitem_source_identifier_type":"ISSN"}]},"item_10001_source_id_32":{"attribute_name":"item_10001_source_id_32","attribute_value_mlt":[{"subitem_source_identifier":"AA00773679","subitem_source_identifier_type":"NCID"}]},"item_10001_version_type_33":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Murakami, Koichi","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"11223","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Eryu, Osamu","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"8780","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"1000010223679","nameIdentifierScheme":"NRID","nameIdentifierURI":"http://rns.nii.ac.jp/nr/1000010223679"}]},{"creatorNames":[{"creatorName":"Takita, Koki","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"11225","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Masuda, Kozo","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"11226","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2017-01-23"}],"displaytype":"detail","filename":"PRL 59_2203.pdf","filesize":[{"value":"660.0 kB"}],"format":"application/pdf","license_note":"(c)2007 The American Physical Society","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"本文_fulltext","url":"https://nitech.repo.nii.ac.jp/record/3913/files/PRL 59_2203.pdf"},"version_id":"6dd0d59b-2e8c-4c4e-bcc9-5eb0758e4b5b"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"item_resource_type","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Explosive crystallization starting from an amorphous-silicon surface region during long pulsed-laser irradiation","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Explosive crystallization starting from an amorphous-silicon surface region during long pulsed-laser irradiation","subitem_title_language":"en"}]},"item_type_id":"10001","owner":"91","path":["31"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2012-11-06"},"publish_date":"2012-11-06","publish_status":"0","recid":"3913","relation_version_is_last":true,"title":["Explosive crystallization starting from an amorphous-silicon surface region during long pulsed-laser irradiation"],"weko_creator_id":"91","weko_shared_id":-1},"updated":"2025-03-12T06:17:12.721966+00:00"}