{"created":"2023-05-15T12:35:41.784981+00:00","id":4711,"links":{},"metadata":{"_buckets":{"deposit":"d6ecb019-f8eb-482e-800d-3d666a55bee9"},"_deposit":{"created_by":3,"id":"4711","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"4711"},"status":"published"},"_oai":{"id":"oai:nitech.repo.nii.ac.jp:00004711","sets":["31"]},"author_link":["15067","15066","15062","6209","15063","15061","15064"],"item_10001_alternative_title_24":{"attribute_name":"その他（別言語等）のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"非対称X線回折によるエピタキシャル薄膜の残留応力の評価手法"}]},"item_10001_biblio_info_28":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1999-07-01","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1247","bibliographicPageEnd":"610","bibliographicPageStart":"606","bibliographicVolumeNumber":"107","bibliographic_titles":[{"bibliographic_title":"Journal of the Ceramic Society of Japan"}]}]},"item_10001_description_36":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"An analytical technique to determine residual stress in eqitaxial thin film by asymmetric X-ray diffraction (XRD) was studied. The residual stresses of PbTiO_3 films were determied by XRD technique and displace measurement technique. Measurement results by these techniques were compared with each other to consider the respective advantages of each technique. The stresses measured by XRD technique were not consistent with those by displacement measurement technique, because the latter technique involves errors which origined from the shape and the size of the substrate. The stress in a polycrystalline film measured by modified sin^2ψ method was in good agreement with that measured by normal sin^2ψ method. This result suggests that modified sin^2ψ method can be applied to stress measurement not only in epitaxial thin films, but also in polycrystalline thin films. We further discuss the precision of the stress determination technique. Residual stress of epitaxial PbTiO_3 film on (100) SrTiO_3 substrate measured by modified sin^2ψ method was comparable to the theoretical stress estimated from the difference in thermal expansion coefficients between the film and the substrate. Stress values measured by modified sin^2ψ method may thus have the precision required for actual application.","subitem_description_type":"Other"}]},"item_10001_description_38":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_10001_full_name_27":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{}],"names":[{"name":"石澤, 伸夫"}]}]},"item_10001_publisher_29":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"The Ceramic Society of Japan"}]},"item_10001_source_id_30":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"09145400","subitem_source_identifier_type":"ISSN"}]},"item_10001_source_id_32":{"attribute_name":"書誌レコードID（NCID）","attribute_value_mlt":[{"subitem_source_identifier":"AN10040326","subitem_source_identifier_type":"NCID"}]},"item_10001_version_type_33":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Uchida, Hiroshi","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kiguchi, Takanori","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Saiki, Atsushi","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Wakiya, Naoki","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Ishizawa, Nobuo","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Shinozaki, Kazuo","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Mizutani, Nobuyasu","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2017-01-24"}],"displaytype":"detail","filename":"JCSJ 107_606.pdf","filesize":[{"value":"1.9 MB"}],"format":"application/pdf","license_note":"(c) 1999 The Ceramic Society of Japan","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"本文_fulltext","url":"https://nitech.repo.nii.ac.jp/record/4711/files/JCSJ 107_606.pdf"},"version_id":"558414b7-1d51-4ecb-9234-15e33c638471"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Measurement Technique for the Evaluation of Residual Stress in Epitaxial Thin Film by Asymmetric X-Ray Diffraction","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Measurement Technique for the Evaluation of Residual Stress in Epitaxial Thin Film by Asymmetric X-Ray Diffraction","subitem_title_language":"en"}]},"item_type_id":"10001","owner":"3","path":["31"],"pubdate":{"attribute_name":"公開日","attribute_value":"2012-11-06"},"publish_date":"2012-11-06","publish_status":"0","recid":"4711","relation_version_is_last":true,"title":["Measurement Technique for the Evaluation of Residual Stress in Epitaxial Thin Film by Asymmetric X-Ray Diffraction"],"weko_creator_id":"3","weko_shared_id":-1},"updated":"2023-05-16T14:43:37.147084+00:00"}