{"created":"2023-05-15T12:35:55.999604+00:00","id":5050,"links":{},"metadata":{"_buckets":{"deposit":"771b66ee-3671-48b4-a9e8-7347d93b3815"},"_deposit":{"created_by":3,"id":"5050","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"5050"},"status":"published"},"_oai":{"id":"oai:nitech.repo.nii.ac.jp:00005050","sets":["31"]},"author_link":["3257","16053","4015","4028"],"item_10001_biblio_info_28":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2002-04-22","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"16","bibliographicPageEnd":"2882","bibliographicPageStart":"2880","bibliographicVolumeNumber":"80","bibliographic_titles":[{"bibliographic_title":"APPLIED PHYSICS LETTERS"}]}]},"item_10001_description_36":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"Highly stressed and strongly adhered nanocrystalline diamond films are grown on Si substrates by providing controlled and continuous bias current density (BCD) in microwave plasma chemical vapor deposition system. The stress and hence the curvature of the films on Si substrates can be varied and controlled by changing the BCD. We propose applications for such stressed films in the areas in which bent crystals are being used for various purposes, i.e., particle physics, x-ray optics, etc. These bent Si substrates can replace crystal benders, a cumbersome mechanical arrangement, used for bending Si in those areas.","subitem_description_type":"Other"}]},"item_10001_description_38":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_10001_full_name_27":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{},{}],"names":[{"name":"曾我, 哲夫"}]},{"nameIdentifiers":[{}],"names":[{"name":"神保, 孝志"}]},{"nameIdentifiers":[{}],"names":[{"name":"梅野, 正義"}]}]},"item_10001_publisher_29":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"American Institute of Physics"}]},"item_10001_relation_34":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"10.1063/1.1471379"}],"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"http://dx.doi.org/10.1063/1.1471379","subitem_relation_type_select":"DOI"}}]},"item_10001_source_id_30":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"00036951","subitem_source_identifier_type":"ISSN"}]},"item_10001_source_id_32":{"attribute_name":"書誌レコードID（NCID）","attribute_value_mlt":[{"subitem_source_identifier":"AA00543432","subitem_source_identifier_type":"NCID"}]},"item_10001_version_type_33":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Sharda, T.","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Soga, Tetsuo","creatorNameLang":"en"}],"nameIdentifiers":[{},{}]},{"creatorNames":[{"creatorName":"Jimbo, Takashi","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Umeno, Masayoshi","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2017-01-25"}],"displaytype":"detail","filename":"APL 80_2880.pdf","filesize":[{"value":"133.0 kB"}],"format":"application/pdf","license_note":"Copyright (2002) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.The following article appeared in Applied physics letters, 80(16), pp.2880-2882; 2002 and may be found at http://link.aip.org/link/?apl/80/2880","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"本文_fulltext","url":"https://nitech.repo.nii.ac.jp/record/5050/files/APL 80_2880.pdf"},"version_id":"f1d78fa8-198a-44a4-b78c-b1c877ff3367"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Highly  stressed carbon film coatings on silicon: Potential applications","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Highly  stressed carbon film coatings on silicon: Potential applications","subitem_title_language":"en"}]},"item_type_id":"10001","owner":"3","path":["31"],"pubdate":{"attribute_name":"公開日","attribute_value":"2012-11-06"},"publish_date":"2012-11-06","publish_status":"0","recid":"5050","relation_version_is_last":true,"title":["Highly  stressed carbon film coatings on silicon: Potential applications"],"weko_creator_id":"3","weko_shared_id":3},"updated":"2023-05-15T14:35:10.844559+00:00"}