@article{oai:nitech.repo.nii.ac.jp:00005134,
 author = {Kato, R. and Hihara, Takehiko and Peng, D. L. and Sumiyama, Kenji},
 issue = {16},
 journal = {APPLIED PHYSICS LETTERS},
 month = {Apr},
 note = {A double-glow discharge cluster source system has been made by modification of a conventional co-sputter-deposition apparatus. Using this equipment, we tried to produce Co clusters generated by a dc glow discharge mode, Si clusters by an rf glow discharge mode, and deposit them simultaneously on a substrate. Putting a separate plate between these two glow discharge rooms, we have obtained a mixture of Co and Si clusters. Here, the Co clusters are distributed rather at random, while the Si clusters are aggregated to form a larger group. Taking off the separate plate, we have obtained core-shell clusters, in which small Si clusters surround Co core clusters. These features are quite different from the instantaneous alloying and/or very rapid atom diffusion that has been expected at contact interfaces between nanometer-sized small Co and Si clusters. They suggest that this double-cluster source system is useful to fabricate various sorts of cluster composites that cannot be prepared by thermodynamical methods, such as co-evaporation and precipitation., application/pdf},
 pages = {2688--2690},
 title = {Composite deposition of Co and Si clusters by rf/dc plasma-gas-codensation},
 volume = {82},
 year = {2003}
}