@article{oai:nitech.repo.nii.ac.jp:00006070,
 author = {Hiroshiba, Nobuya and Yano, Wataru and Okumura, Ryuji and Ichikawa, Yo},
 issue = {2},
 journal = {IEICE transactions on electronics},
 month = {},
 note = {We demonstrated a novel technique to fabricate nanosized structures on a Nafion membrane, using thermal nanoimprinting with a 5 × 5 <I>μ</I>m<SUP>2</SUP> square pattern Si mold without any polymer damage. A 24 MPa thermal imprinting pressure was used for 10 min. We observed high aspect ratio (∼1:10) pillars on the surface after imprinting at 200°C. Finally, we used a novel quartz mold with a 200 nm resolution dot pattern., application/pdf},
 pages = {133--135},
 title = {Fabrication of Nanosized Structures on Nafion Membranes by Thermal Nanoimprinting},
 volume = {98},
 year = {2015}
}