{"created":"2023-05-15T12:36:39.698013+00:00","id":6070,"links":{},"metadata":{"_buckets":{"deposit":"0acbbc6a-a82a-4fbd-bda8-8d80f6048567"},"_deposit":{"created_by":3,"id":"6070","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"6070"},"status":"published"},"_oai":{"id":"oai:nitech.repo.nii.ac.jp:00006070","sets":["31"]},"author_link":["19704","8564","22036","22035"],"item_10001_biblio_info_28":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2015","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"2","bibliographicPageEnd":"135","bibliographicPageStart":"133","bibliographicVolumeNumber":"98","bibliographic_titles":[{},{"bibliographic_title":"IEICE transactions on electronics","bibliographic_titleLang":"en"}]}]},"item_10001_description_36":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"We demonstrated a novel technique to fabricate nanosized structures on a Nafion membrane, using thermal nanoimprinting with a 5 × 5 <I>μ</I>m<SUP>2</SUP> square pattern Si mold without any polymer damage. A 24 MPa thermal imprinting pressure was used for 10 min. We observed high aspect ratio (∼1:10) pillars on the surface after imprinting at 200°C. Finally, we used a novel quartz mold with a 200 nm resolution dot pattern.","subitem_description_type":"Other"}]},"item_10001_description_38":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_10001_full_name_27":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{},{}],"names":[{"name":"市川, 洋"}]}]},"item_10001_publisher_29":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"The Institute of Electronics, Information and Communication Engineers"}]},"item_10001_relation_34":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"10.1587/transele.E98.C.133"}],"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"http://doi.org/10.1587/transele.E98.C.133","subitem_relation_type_select":"DOI"}}]},"item_10001_relation_35":{"attribute_name":"論文ID（NAID）","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"130004841695"}],"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"http://ci.nii.ac.jp/naid/130004841695","subitem_relation_type_select":"NAID"}}]},"item_10001_source_id_30":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"09168524","subitem_source_identifier_type":"ISSN"}]},"item_10001_source_id_32":{"attribute_name":"書誌レコードID（NCID）","attribute_value_mlt":[{"subitem_source_identifier":"AA10826283","subitem_source_identifier_type":"NCID"}]},"item_10001_version_type_33":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Hiroshiba, Nobuya","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Yano, Wataru","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Okumura, Ryuji","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Ichikawa, Yo","creatorNameLang":"en"}],"nameIdentifiers":[{},{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2017-07-21"}],"displaytype":"detail","filename":"IchikawaYo_2014_P1.pdf","filesize":[{"value":"415.3 kB"}],"format":"application/pdf","license_note":"copyright(C)2015 IEICE","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"本文_fulltext","url":"https://nitech.repo.nii.ac.jp/record/6070/files/IchikawaYo_2014_P1.pdf"},"version_id":"b741ea3e-6b09-4622-b92a-72344c3b6543"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Nanoimprinting","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Ion-conductive polymer","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Nafion","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Flexible devices","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Fabrication of Nanosized Structures on Nafion Membranes by Thermal Nanoimprinting","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Fabrication of Nanosized Structures on Nafion Membranes by Thermal Nanoimprinting","subitem_title_language":"en"}]},"item_type_id":"10001","owner":"3","path":["31"],"pubdate":{"attribute_name":"公開日","attribute_value":"2017-07-21"},"publish_date":"2017-07-21","publish_status":"0","recid":"6070","relation_version_is_last":true,"title":["Fabrication of Nanosized Structures on Nafion Membranes by Thermal Nanoimprinting"],"weko_creator_id":"3","weko_shared_id":3},"updated":"2023-05-15T14:02:07.413290+00:00"}