{"created":"2023-05-15T12:36:39.947827+00:00","id":6076,"links":{},"metadata":{"_buckets":{"deposit":"239c5b66-d6f6-4b4c-a92c-2d74ba6d047c"},"_deposit":{"created_by":3,"id":"6076","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"6076"},"status":"published"},"_oai":{"id":"oai:nitech.repo.nii.ac.jp:00006076","sets":["31"]},"author_link":["22061","8139","6762"],"item_10001_alternative_title_24":{"attribute_name":"その他（別言語等）のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"A Practice of T^2-Q Control Charts in Semiconductor Manufacturing Process : A paradigm shift from monitoring the amount of variation to monitoring the pattern of variation"}]},"item_10001_biblio_info_28":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2014","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"3","bibliographicPageEnd":"350","bibliographicPageStart":"341","bibliographicVolumeNumber":"44","bibliographic_titles":[{"bibliographic_title":"品質"}]}]},"item_10001_description_36":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"半導体製造工程(ウエーハプロセス)においては,品質特性のウエーハ内変動の大きさより変動パターンが問題となる場合がある.ウエーハ内の変動パターンには,加工装置への副生成物の付着や主要パーツの劣化,副生成物の除去とパーツ交換を行う装置メンテナンスの効果を受け,特有の繰り返しパターンが現れる.このウエーハ内変動は\"ばらつきの大きさ\"ではなく\"ばらつきのパターン\"であることから,ウエーハ内変動をばらつきパターンの情報を持たないR管理図によってモニターすることは妥当ではなく,測定位置を変数とした多変量管理図の利用を考えることができる.本研究では,多変量管理図の変形でありJackson and Mudholkar(1979)によって提案されたT^2-Q管理図に着目し,1)T^2統計量とQ統計量を構成する主成分の分割に対する考え方 2)寄与プロットの応用 3)ばらつきのパターンをモニタリングする必要性について提案と考察を行う.この考え方は,従来型管理図の主流であった変動の大きさの管理から,変動パターンの管理に視点を転換する方法の一つである.","subitem_description_type":"Other"}]},"item_10001_description_38":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_10001_full_name_27":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{}],"names":[{"name":"Nishina, Ken"}]}]},"item_10001_publisher_29":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"日本品質管理学会"}]},"item_10001_relation_34":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"10.20684/quality.44.3_341"}],"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"http://doi.org/10.20684/quality.44.3_341","subitem_relation_type_select":"DOI"}}]},"item_10001_relation_35":{"attribute_name":"論文ID（NAID）","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"110009833208"}],"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"http://ci.nii.ac.jp/naid/110009833208","subitem_relation_type_select":"NAID"}}]},"item_10001_source_id_30":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"03868230","subitem_source_identifier_type":"ISSN"}]},"item_10001_source_id_32":{"attribute_name":"書誌レコードID（NCID）","attribute_value_mlt":[{"subitem_source_identifier":"AN00354769","subitem_source_identifier_type":"NCID"}]},"item_10001_version_type_33":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"東出, 政信"},{"creatorName":"ヒガシデ, マサノブ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"仁科, 健"},{"creatorName":"ニシナ, ケン","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"川村, 大伸"},{"creatorName":"カワムラ, ヒロノブ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{},{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2017-07-26"}],"displaytype":"detail","filename":"NishinaKen_2014_P1.pdf","filesize":[{"value":"1.2 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"本文_fulltext","url":"https://nitech.repo.nii.ac.jp/record/6076/files/NishinaKen_2014_P1.pdf"},"version_id":"bd7e2b99-ade1-4388-954a-81f545a7aec8"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Dry Etching Process","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Mahalanobis Distance","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Multivariate Control Chart","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Pattern of Variation","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Principal Component Analysis","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"半導体製造工程におけるT2-Q管理図の実践 : 変動の大きさの管理から変動パターンの管理へ","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"半導体製造工程におけるT2-Q管理図の実践 : 変動の大きさの管理から変動パターンの管理へ"}]},"item_type_id":"10001","owner":"3","path":["31"],"pubdate":{"attribute_name":"公開日","attribute_value":"2017-07-26"},"publish_date":"2017-07-26","publish_status":"0","recid":"6076","relation_version_is_last":true,"title":["半導体製造工程におけるT2-Q管理図の実践 : 変動の大きさの管理から変動パターンの管理へ"],"weko_creator_id":"3","weko_shared_id":3},"updated":"2023-05-15T13:29:13.045172+00:00"}