@article{oai:nitech.repo.nii.ac.jp:00006798,
 author = {清原, 正勝},
 journal = {名古屋工業大学先進セラミックス研究センター年報 = Annual report Advanced Ceramics Research Center Nagoya Institute of Technology},
 month = {Jul},
 note = {Aerosol Deposition Method (ADM) is a new technology of ceramics film deposition. Using this method, we can deposit various ceramics thick films (one-several hundred micrometer of thickness) on metal, glass and ceramics substrates. It's normal temperature process and doesn't require any heating expedient. Films have dense, nano-crystalline structure, good adhesion on many substrate and good mechanical properties. For several years, we have been developing this process. In this paper, overview of application to semiconductor manufacturing equipment parts by ADM was reported., application/pdf},
 pages = {39--42},
 title = {エアロゾルデポジション法の紹介とその応用},
 volume = {7},
 year = {2019}
}