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ケンシュツキ タレンソウガタ コウブンカイノウ キドウ ホウシャコウ フンマツ カイセキケイ ニヨリ ソクテイ サレタ カイセキ データ ノ カイセキホウ ノ カイハツ
Development of Analytical Method for Diffraction Intensity Data Measured with a High-Resolution Synchrotron X-ray Powder Diffractometer
Development of Analytical Method for Diffraction Intensity Data Measured with a High-Resolution Synchrotron X-ray Powder Diffractomete
セラミックス基盤工学研究センター年報 = Annual report of the Ceramics Research Laboratory Nagoya Institute of Technology
巻
5
ページ
1 - 11
発行年
2006-03-31
出版者
名古屋工業大学セラミックス基盤工学研究センター
ISSN
13471694
書誌レコードID
AA11625130
著者版フラグ
publisher
内容記述
A new analytical method to obtain a series of aberration-free diffraction intensity data from the segmented intensity data collectedwith a high-resolution synchrotron X-ray powder diffractometer with a multiple-detector system has been developed. The methodincludes (i) adjustment of variation in peak profiles measured with different detectors, (ii) deconvolution of axial-divergenceaberration, and (iii) removal of asymmetry introduced by the aberration of the beamline optics. The method has been applied toanalyze the diffraction intensity data of a ZnO powder sample (NIST SRM674) measured with a multiple-detector diffractometer(MDS) on the beamline 4B2 at the Photon Factory, KEK in Tsukuba. The characteristics of the beamline aberration had beenseparately evaluated by analyzing the diffraction intensity data of Si powder (NIST SRM640b). It has been confirmed that theobserved asymmetry caused by the aberrations of the beamline-optics and the diffractometer can certainly be removed by the method.As a result, the integrated diffraction intensity can easily be evaluated by profile fitting method based on application of a simplesymmetric model profile function.