WEKO3
アイテム
Determination of optical properties of nitrogen-doped hydrogenated amorphous carbon films by spectroscopic ellipsometry
https://nitech.repo.nii.ac.jp/records/4964
https://nitech.repo.nii.ac.jp/records/4964d0cb2d64-1aa1-43a2-999a-46631c9ce229
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
本文_fulltext (58.2 kB)
|
Copyright (2001) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.The following article appeared in Applied physics letters, 78(25), pp.3962-3964; 2001 and may be found at http://link.aip.org/link/?apl/78/3962
|
| Item type | 学術雑誌論文 / Journal Article(1) | |||||||||||||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| 公開日 | 2012-11-06 | |||||||||||||||||||||||||
| タイトル | ||||||||||||||||||||||||||
| タイトル | Determination of optical properties of nitrogen-doped hydrogenated amorphous carbon films by spectroscopic ellipsometry | |||||||||||||||||||||||||
| 言語 | en | |||||||||||||||||||||||||
| 言語 | ||||||||||||||||||||||||||
| 言語 | eng | |||||||||||||||||||||||||
| 資源タイプ | ||||||||||||||||||||||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||||||||||||||||||||||
| 資源タイプ | journal article | |||||||||||||||||||||||||
| 著者 |
Hayashi, Y.
× Hayashi, Y.
× Yu, G.
× Rahman, M. M.
× Krishna, K. M.
× 曾我, 哲夫
× Jimbo, Takashi
× Umeno, Masayoshi
|
|||||||||||||||||||||||||
| 著者別名 | ||||||||||||||||||||||||||
| 姓名 | Soga, Tetsuo | |||||||||||||||||||||||||
| 言語 | en | |||||||||||||||||||||||||
| 姓名 | 曾我, 哲夫 | |||||||||||||||||||||||||
| 言語 | ja | |||||||||||||||||||||||||
| 姓名 | ソガ, テツオ | |||||||||||||||||||||||||
| 言語 | ja-Kana | |||||||||||||||||||||||||
| 著者別名 | ||||||||||||||||||||||||||
| 姓名 | 神保, 孝志 | |||||||||||||||||||||||||
| 著者別名 | ||||||||||||||||||||||||||
| 姓名 | 梅野, 正義 | |||||||||||||||||||||||||
| bibliographic_information |
en : APPLIED PHYSICS LETTERS 巻 78, 号 25, p. 3962-3964, 発行日 2001-06-18 |
|||||||||||||||||||||||||
| 出版者 | ||||||||||||||||||||||||||
| 出版者 | American Institute of Physics | |||||||||||||||||||||||||
| 言語 | en | |||||||||||||||||||||||||
| ISSN | ||||||||||||||||||||||||||
| 収録物識別子タイプ | ISSN | |||||||||||||||||||||||||
| 収録物識別子 | 0003-6951 | |||||||||||||||||||||||||
| item_10001_source_id_32 | ||||||||||||||||||||||||||
| 収録物識別子タイプ | NCID | |||||||||||||||||||||||||
| 収録物識別子 | AA00543432 | |||||||||||||||||||||||||
| 出版タイプ | ||||||||||||||||||||||||||
| 出版タイプ | VoR | |||||||||||||||||||||||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||||||||||||||||||||||
| item_10001_relation_34 | ||||||||||||||||||||||||||
| 関連タイプ | isIdenticalTo | |||||||||||||||||||||||||
| 識別子タイプ | DOI | |||||||||||||||||||||||||
| 関連識別子 | http://dx.doi.org/10.1063/1.1374501 | |||||||||||||||||||||||||
| 関連名称 | 10.1063/1.1374501 | |||||||||||||||||||||||||
| 内容記述 | ||||||||||||||||||||||||||
| 内容記述タイプ | Other | |||||||||||||||||||||||||
| 内容記述 | Nitrogen-doped hydrogenated amorphous carbon films have been deposited on silicon substrates by radio-frequency plasma-enhanced chemical vapor deposition using different N2/CH4 gas ratios from 0 to 3. The real and imaginary parts, n and k, of the complex index of refraction of these films have been determined for wavelengths between 300 and 830 nm by spectroscopic ellipsometry. Excellent agreement has been found between measured and modeled spectra, in which an empirical dielectric function based on classical Lorentz oscillator and Tauc joint density of states, and a linear void distribution along the thickness of the films have been assumed. Decrease in the optical energy gap and increase in the extinction coefficient, k, with increase in nitrogen concentration have been observed. Refractive index, n, increases rapidly with increase in nitrogen concentration up to 6.8 at.% (?7.0 at.%) and then increases slowly with further increase in nitrogen concentration. For all the samples, n is found to be highest at the film-substrate interface which gradually decreases towards the film surface. | |||||||||||||||||||||||||
| 言語 | en | |||||||||||||||||||||||||
