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Composite deposition of Co and Si clusters by rf/dc plasma-gas-codensation
https://nitech.repo.nii.ac.jp/records/5134
https://nitech.repo.nii.ac.jp/records/5134e6f6a0ac-ed86-42fc-a0fd-5cace228c00b
名前 / ファイル | ライセンス | アクション |
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本文_fulltext (600.5 kB)
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Copyright (2003) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.The following article appeared in Applied physics letters, 82(16),pp.2688-2690 ; 2003 and may be found at http://link.aip.org/link/?apl/82/2688
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2012-11-06 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Composite deposition of Co and Si clusters by rf/dc plasma-gas-codensation | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
Kato, R.
× Kato, R.× Hihara, Takehiko× Peng, D. L.× Sumiyama, Kenji |
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著者別名 | ||||||
姓名 | 日原, 岳彦 | |||||
著者別名 | ||||||
姓名 | 隅山, 兼治 | |||||
書誌情報 |
APPLIED PHYSICS LETTERS 巻 82, 号 16, p. 2688-2690, 発行日 2003-04-21 |
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出版者 | ||||||
出版者 | American Institute of Physics | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 00036951 | |||||
書誌レコードID(NCID) | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA00543431 | |||||
著者版フラグ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
DOI | ||||||
関連タイプ | isIdenticalTo | |||||
識別子タイプ | DOI | |||||
関連識別子 | http://dx.doi.org/10.1063/1.1569037 | |||||
関連名称 | 10.1063/1.1569037 | |||||
内容記述 | ||||||
内容記述タイプ | Other | |||||
内容記述 | A double-glow discharge cluster source system has been made by modification of a conventional co-sputter-deposition apparatus. Using this equipment, we tried to produce Co clusters generated by a dc glow discharge mode, Si clusters by an rf glow discharge mode, and deposit them simultaneously on a substrate. Putting a separate plate between these two glow discharge rooms, we have obtained a mixture of Co and Si clusters. Here, the Co clusters are distributed rather at random, while the Si clusters are aggregated to form a larger group. Taking off the separate plate, we have obtained core-shell clusters, in which small Si clusters surround Co core clusters. These features are quite different from the instantaneous alloying and/or very rapid atom diffusion that has been expected at contact interfaces between nanometer-sized small Co and Si clusters. They suggest that this double-cluster source system is useful to fabricate various sorts of cluster composites that cannot be prepared by thermodynamical methods, such as co-evaporation and precipitation. | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf |