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アイテム / Calculation of point defect concentrations in GaAs grown by molecular beam epitaxy / JAP 72_1200

JAP 72_1200


JAP 72_1200.pdf
83dea5ff-ddfe-48e7-ae75-1d05a9fead93
https://nitech.repo.nii.ac.jp/record/4165/files/JAP 72_1200.pdf
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JAPJAP 72_1200.pdf (372.5 kB) sha256 df89aff2743d1da2e8b459e84811d964156a086a2e686166ebdba9d7fb55406c Copyright (1992) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.The following article appeared in Journal of Applied Physics, 72(3), pp.1200- 1202 ; 1992 and may be found at http://link.aip.org/link/?jap/72/1200
公開日 2017-01-23
ファイル名 JAP 72_1200.pdf
本文URL https://nitech.repo.nii.ac.jp/record/4165/files/JAP 72_1200.pdf
ラベル 本文_fulltext
フォーマット application/pdf
サイズ 372.5 kB
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