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Growth of InxGa1-xAs quantum dots by metal-organic chemical vapor deposition on Si substrates and in GaAs-based lasers
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Copyright (2001) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.The following article appeared in Journal of Applied Physics, 90(11), pp.5463 - 5468; 2001 and may be found at http://link.aip.org/link/?jap/90/5463
The growth conditions of low-dimensional dot structures of strained InxGa1-xAs on Si substrates using the Stranski-Krastanov growth mode by metal-organic chemical vapor deposition are optimized. Atomic force microscopy measurement has been performed to characterize the dot structures. The dot density and their size are found to be strongly dependent on the substrate temperature, In content, and V/III ratio. The optimized growth condition was further used to fabricate quantum dot-like laser diodes on Si. The characteristics of the laser diode with an InxGa1-xAs quantum dot-like active region are analyzed.
Growth of InxGa1-xAs quantum dots by metal-organic chemical vapor deposition on Si substrates and in GaAs-based lasers
本文_fulltext
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