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{"_buckets": {"deposit": "b67c63b8-800a-4a7c-980b-d63be0f29c3d"}, "_deposit": {"created_by": 3, "id": "6798", "owners": [3], "pid": {"revision_id": 0, "type": "depid", "value": "6798"}, "status": "published"}, "_oai": {"id": "oai:nitech.repo.nii.ac.jp:00006798", "sets": ["651"]}, "author_link": ["22860"], "item_9_alternative_title_1": {"attribute_name": "その他(別言語等)のタイトル", "attribute_value_mlt": [{"subitem_alternative_title": "Introduction of the Aerosol Deposition Method and Its Applications"}]}, "item_9_biblio_info_5": {"attribute_name": "書誌情報", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2019-07-31", "bibliographicIssueDateType": "Issued"}, "bibliographicPageEnd": "42", "bibliographicPageStart": "39", "bibliographicVolumeNumber": "7", "bibliographic_titles": [{"bibliographic_title": "名古屋工業大学先進セラミックス研究センター年報 = Annual report Advanced Ceramics Research Center Nagoya Institute of Technology"}]}]}, "item_9_description_10": {"attribute_name": "内容記述", "attribute_value_mlt": [{"subitem_description": "Aerosol Deposition Method (ADM) is a new technology of ceramics film deposition. Using this method, we can deposit various ceramics thick films (one-several hundred micrometer of thickness) on metal, glass and ceramics substrates. It\u0027s normal temperature process and doesn\u0027t require any heating expedient. Films have dense, nano-crystalline structure, good adhesion on many substrate and good mechanical properties. For several years, we have been developing this process. In this paper, overview of application to semiconductor manufacturing equipment parts by ADM was reported.\n", "subitem_description_type": "Other"}]}, "item_9_description_11": {"attribute_name": "フォーマット", "attribute_value_mlt": [{"subitem_description": "application/pdf", "subitem_description_type": "Other"}]}, "item_9_heading_13": {"attribute_name": "見出し", "attribute_value_mlt": [{"subitem_heading_banner_headline": "<解説>", "subitem_heading_language": "ja"}, {"subitem_heading_banner_headline": "\u003cReview\u003e", "subitem_heading_language": "en"}]}, "item_9_link_14": {"attribute_name": "論文ID(NAID)", "attribute_value_mlt": [{"subitem_link_text": "40022028535", "subitem_link_url": "https://ci.nii.ac.jp/naid/40022028535"}]}, "item_9_publisher_6": {"attribute_name": "出版者", "attribute_value_mlt": [{"subitem_publisher": "名古屋工業大学先進セラミックス研究センター"}]}, "item_9_source_id_7": {"attribute_name": "ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "21876738", "subitem_source_identifier_type": "ISSN"}]}, "item_9_source_id_8": {"attribute_name": "書誌レコードID", "attribute_value_mlt": [{"subitem_source_identifier": "AA12617342", "subitem_source_identifier_type": "NCID"}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "清原, 正勝"}], "nameIdentifiers": [{"nameIdentifier": "22860", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "ファイル情報", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2021-09-27"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "arnit2018_39.pdf", "filesize": [{"value": "2.9 MB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_free", "mimetype": "application/pdf", "size": 2900000.0, "url": {"label": "本文_fulltext", "url": "https://nitech.repo.nii.ac.jp/record/6798/files/arnit2018_39.pdf"}, "version_id": "39dab823-f026-4589-9813-62771095ad86"}]}, "item_keyword": {"attribute_name": "キーワード", "attribute_value_mlt": [{"subitem_subject": "Aerosol Deposition Method (ADM)", "subitem_subject_language": "en", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Yttrium Oxide", "subitem_subject_language": "en", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Semiconductor Manufacture Equipment", "subitem_subject_language": "en", "subitem_subject_scheme": "Other"}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "jpn"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "departmental bulletin paper", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "エアロゾルデポジション法の紹介とその応用", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "エアロゾルデポジション法の紹介とその応用"}]}, "item_type_id": "9", "owner": "3", "path": ["651"], "permalink_uri": "https://nitech.repo.nii.ac.jp/records/6798", "pubdate": {"attribute_name": "公開日", "attribute_value": "2021-09-27"}, "publish_date": "2021-09-27", "publish_status": "0", "recid": "6798", "relation": {}, "relation_version_is_last": true, "title": ["エアロゾルデポジション法の紹介とその応用"], "weko_shared_id": 3}
エアロゾルデポジション法の紹介とその応用
https://nitech.repo.nii.ac.jp/records/6798
https://nitech.repo.nii.ac.jp/records/6798a92e226f-589f-4226-8d46-e4969b29e705
名前 / ファイル | ライセンス | アクション |
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本文_fulltext (2.9 MB)
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Item type | 紀要論文 / Departmental Bulletin Paper_04(1) | |||||
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公開日 | 2021-09-27 | |||||
タイトル | ||||||
タイトル | エアロゾルデポジション法の紹介とその応用 | |||||
言語 | ||||||
言語 | jpn | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | departmental bulletin paper | |||||
その他(別言語等)のタイトル | ||||||
その他のタイトル | Introduction of the Aerosol Deposition Method and Its Applications | |||||
著者 |
清原, 正勝
× 清原, 正勝 |
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書誌情報 |
名古屋工業大学先進セラミックス研究センター年報 = Annual report Advanced Ceramics Research Center Nagoya Institute of Technology 巻 7, p. 39-42, 発行日 2019-07-31 |
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出版者 | ||||||
出版者 | 名古屋工業大学先進セラミックス研究センター | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 21876738 | |||||
書誌レコードID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA12617342 | |||||
論文ID(NAID) | ||||||
40022028535 | ||||||
https://ci.nii.ac.jp/naid/40022028535 | ||||||
内容記述 | ||||||
内容記述タイプ | Other | |||||
内容記述 | Aerosol Deposition Method (ADM) is a new technology of ceramics film deposition. Using this method, we can deposit various ceramics thick films (one-several hundred micrometer of thickness) on metal, glass and ceramics substrates. It's normal temperature process and doesn't require any heating expedient. Films have dense, nano-crystalline structure, good adhesion on many substrate and good mechanical properties. For several years, we have been developing this process. In this paper, overview of application to semiconductor manufacturing equipment parts by ADM was reported. | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | Aerosol Deposition Method (ADM) | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | Yttrium Oxide | |||||
キーワード | ||||||
言語 | en | |||||
主題Scheme | Other | |||||
主題 | Semiconductor Manufacture Equipment | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf | |||||
見出し | ||||||
大見出し | <解説> | |||||
言語 | ja | |||||
見出し | ||||||
大見出し | <Review> | |||||
言語 | en |